Stijn Mahieu: Reactive Sputter Deposition

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Cover: 9783540766629 | Reactive Sputter Deposition | Stijn Mahieu (u. a.) | Buch | xviii

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Sprache: Englisch

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Beschreibung

The most straightforwardmethod to change the surface properties of a ma- rial is to deposit a thin ?lm or coating on it. Hence, it is not surprising that an overwhelming amount of scienti?c and technical papers is published each year on this topic. Sputter deposition is one of the many so-called physical vapour deposition (PVD) techniques. In most cases, sputter deposition uses a magnetically enhanced glow discharge or magnetron discharge to produce the ions which bombard and sputter the cathode material. In the ?rst chapter of this book (Chap. 1), the details of the sputter process are discussed. Essential to sustain the discharge is the electron emission during ion bombardment. Indeed, the emitted electrons are accelerated from the target and can ionize gas atoms. The formed ions bombard again the target completing the s- taining process. A complete chapter is assigned to this process to highlight its importance (Chap. 2). Although the sustaining process can be described quite straightforward, a complete understanding of the magnetron discharge and the in?uence of di?erent parameters on the discharge characteristics is onlypossiblebymodelling(seeChap.3).Withthesethreechapters,thereader should be able to form an idea of the target and plasma processes occurring during a DC magnetron discharge.

Über den Autor

Prof. Dr. D. Depla has received his Master Degree in Chemistry in 1991 at Ghent University (Belgium). In 1996 he promoted with a PhD thesis on Solid State Chemistry. After a short period as senior scientist in the Department for Solid State Sciences, he became in 1999 Professor at the Department for Solid State Sciences where his research focussed on the fundamental aspects of reactive magnetron sputtering. He has shown the importance of ion implantation in the description of the reactive magnetron sputter process. In this way, his continuous research in this area resulted in several publications.

Dr. S. Mahieu received his Master Degree in Physics in 2002 and promoted in 2006 with the PhD thesis entitled "Biaxial alignment in sputter deposited thin films" in the department of Solid State Sciences, Ghent University (Belgium). During his PhD, he focussed on the modelling of thin film growth, plasma characterization and the simulation of transport of sputtered particles, resulting in the elaboration of a new structure zone model as published in an invited review in Thin Solid Films. As Postdoctoral Fellow of the Research Foundation - Flanders (FWO), his current research is focussed on characterizing and modelling the relation between thin film growth and the energy flux towards the substrate during magnetron sputtering.

Zusammenfassung

Covers all the sputtering techniques for thin-film deposition

Describes the physical basics and related technical realization

Gives advice on controlling the sputter process and quality of the layers produced

Valuable reference work for researchers as well as study text for graduate students

Includes supplementary material: [...]

Inhaltsverzeichnis

Simulation of the Sputtering Process.- Electron Emission from Surfaces Induced by Slow Ions and Atoms.- Modeling of the Magnetron Discharge.- Modelling of Reactive Sputtering Processes.- Depositing Aluminium Oxide: A Case Study of Reactive Magnetron Sputtering.- Transport of Sputtered Particles Through the Gas Phase.- Energy Deposition at the Substrate in a Magnetron Sputtering System.- Process Diagnostics.- Optical Plasma Diagnostics During Reactive Magnetron Sputtering.- Reactive Magnetron Sputtering of Indium Tin Oxide Thin Films: The Cross-Corner and Cross-Magnetron Effect.- Reactively Sputter-Deposited Solid Electrolytes and Their Applications.- Reactive SputteredWide-Bandgap p-Type Semiconducting Spinel AB2O4 and Delafossite ABO2 Thin Films for "Transparent Electronics".- Oxide-Based Electrochromic Materials and Devices Prepared by Magnetron Sputtering.- Atomic Assembly of Magnetoresistive Multilayers.

Details

Erscheinungsjahr:	2008
Fachbereich:	Fertigungstechnik
Genre:	Technik
Rubrik:	Naturwissenschaften & Technik
Medium:	Buch
Seiten:	592
Reihe:	Springer Series in Materials Science
Inhalt:	xviii 572 S.
ISBN-13:	9783540766629
ISBN-10:	3540766626
Sprache:	Englisch
Herstellernummer:	12067657
Ausstattung / Beilage:	HC runder Rücken kaschiert
Einband:	Gebunden
Redaktion:	Mahieu, Stijn Depla, Diederik
Herausgeber:	Diederik Depla/Stijn Mahieu
Auflage:	2008
Hersteller:	Springer-Verlag GmbH Springer Berlin Heidelberg Springer Series in Materials Science
Maße:	241 x 160 x 42 mm
Von/Mit:	Stijn Mahieu (u. a.)
Erscheinungsdatum:	24.04.2008
Gewicht:	1,153 kg

preigu-id: 101909648