Zum Hauptinhalt springen Zur Suche springen Zur Hauptnavigation springen
Dekorationsartikel gehören nicht zum Leistungsumfang.
Fundamentals of Electromigration-Aware Integrated Circuit Design
Buch von Jens Lienig (u. a.)
Sprache: Englisch

114,95 €*

-17 % UVP 139,09 €
inkl. MwSt.

Versandkostenfrei per Post / DHL

Lieferzeit 1-2 Wochen

Produkt Anzahl: Gib den gewünschten Wert ein oder benutze die Schaltflächen um die Anzahl zu erhöhen oder zu reduzieren.
Kategorien:
Beschreibung

The book provides a comprehensive overview of electromigration and its effects on the reliability of electronic circuits. This second edition has been updated to introduce recent advancements in the understanding of the physical process of electromigration, which gives the reader the knowledge for adopting appropriate counter measures. A comprehensive set of options is presented for modifying the present IC design methodology to prevent electromigration. Finally, the authors show how specific effects can be exploited in present and future technologies to reduce electromigration's negative impact on circuit reliability.

Contents

Introduction - Fundamentals of Electromigration - Integrated Circuit Design and Electromigration - Mitigating Electromigration in Physical Design - Summary and Outlook

"This improved, second edition of the book provides the fundamental science necessary for a sound grounding from which to make practical use of the complete and indispensable application-oriented information regarding the electromigration-aware design of electronic systems. It is a foundational reference for today's design professionals, as well as for the next generation of engineering students."

Prof. Worthy Martin, Emeritus Associate Professor of Computer Science, University of Virginia

"This is a long-awaited book bridging the design and reliability methodologies imperative for generating robust and high-performing semiconductor devices. A deep insight into physics of the electromigration induced degradation of on-chip interconnect components as well as explaining a design specific failure development are beneficial for both the chip-design and materials engineering communities."

Dr. Valeriy Sukharev, Chief Scientist, Siemens EDA

"This book summarizes our current understanding of electromigration and how its effects can be moderated in practice. Particularly important and valuable are techniques that can address electromigration in modern automated design flows."

Dr. Igor Markov, Distinguished Architect, Synopsys, Inc.

The book provides a comprehensive overview of electromigration and its effects on the reliability of electronic circuits. This second edition has been updated to introduce recent advancements in the understanding of the physical process of electromigration, which gives the reader the knowledge for adopting appropriate counter measures. A comprehensive set of options is presented for modifying the present IC design methodology to prevent electromigration. Finally, the authors show how specific effects can be exploited in present and future technologies to reduce electromigration's negative impact on circuit reliability.

Contents

Introduction - Fundamentals of Electromigration - Integrated Circuit Design and Electromigration - Mitigating Electromigration in Physical Design - Summary and Outlook

"This improved, second edition of the book provides the fundamental science necessary for a sound grounding from which to make practical use of the complete and indispensable application-oriented information regarding the electromigration-aware design of electronic systems. It is a foundational reference for today's design professionals, as well as for the next generation of engineering students."

Prof. Worthy Martin, Emeritus Associate Professor of Computer Science, University of Virginia

"This is a long-awaited book bridging the design and reliability methodologies imperative for generating robust and high-performing semiconductor devices. A deep insight into physics of the electromigration induced degradation of on-chip interconnect components as well as explaining a design specific failure development are beneficial for both the chip-design and materials engineering communities."

Dr. Valeriy Sukharev, Chief Scientist, Siemens EDA

"This book summarizes our current understanding of electromigration and how its effects can be moderated in practice. Particularly important and valuable are techniques that can address electromigration in modern automated design flows."

Dr. Igor Markov, Distinguished Architect, Synopsys, Inc.

Über den Autor

Jens Lienig is the director of the Institute of Electromechanical and Electronic Design at Dresden University of Technology, Germany. He received his Ph.D. in the field of computer-aided physical design of multi-chip modules and was employed as a researcher at University of Virginia, Charlottesville and Concordia University, Montreal. Afterwards he worked as project manager at Tanner Research, Inc. and Robert Bosch GmbH.

Susann Rothe is a scientific assistant at Dresden University of Technology, Germany. She is working towards her Ph.D. in the field of migration modeling and verification with physics-based models. Her research interests include technology characterization and temperature effects for interconnect reliability.

Matthias Thiele is a scientific assistant at Dresden University of Technology, Germany. He received his Ph.D. in the field of electromigration avoidance in physical design. Currently he works on the reliability of electronic, mechatronic and photonic systems.

Inhaltsverzeichnis

Introduction.- Fundamentals of Electromigration.- Integrated Circuit Design and Electromigration.- Mitigating Electromigration in Physical Design.- Summary and Outlook.

Details
Erscheinungsjahr: 2025
Fachbereich: Nachrichtentechnik
Genre: Mathematik, Medizin, Naturwissenschaften, Technik
Rubrik: Naturwissenschaften & Technik
Medium: Buch
Inhalt: xv
167 S.
5 s/w Illustr.
95 farbige Illustr.
167 p. 100 illus.
95 illus. in color.
ISBN-13: 9783031800221
ISBN-10: 3031800222
Sprache: Englisch
Einband: Gebunden
Autor: Lienig, Jens
Thiele, Matthias
Rothe, Susann
Auflage: Second Edition 2025
Hersteller: Springer Nature Switzerland
Springer International Publishing AG
Verantwortliche Person für die EU: Springer Verlag GmbH, Tiergartenstr. 17, D-69121 Heidelberg, juergen.hartmann@springer.com
Maße: 241 x 160 x 16 mm
Von/Mit: Jens Lienig (u. a.)
Erscheinungsdatum: 26.02.2025
Gewicht: 0,479 kg
Artikel-ID: 131699211
Über den Autor

Jens Lienig is the director of the Institute of Electromechanical and Electronic Design at Dresden University of Technology, Germany. He received his Ph.D. in the field of computer-aided physical design of multi-chip modules and was employed as a researcher at University of Virginia, Charlottesville and Concordia University, Montreal. Afterwards he worked as project manager at Tanner Research, Inc. and Robert Bosch GmbH.

Susann Rothe is a scientific assistant at Dresden University of Technology, Germany. She is working towards her Ph.D. in the field of migration modeling and verification with physics-based models. Her research interests include technology characterization and temperature effects for interconnect reliability.

Matthias Thiele is a scientific assistant at Dresden University of Technology, Germany. He received his Ph.D. in the field of electromigration avoidance in physical design. Currently he works on the reliability of electronic, mechatronic and photonic systems.

Inhaltsverzeichnis

Introduction.- Fundamentals of Electromigration.- Integrated Circuit Design and Electromigration.- Mitigating Electromigration in Physical Design.- Summary and Outlook.

Details
Erscheinungsjahr: 2025
Fachbereich: Nachrichtentechnik
Genre: Mathematik, Medizin, Naturwissenschaften, Technik
Rubrik: Naturwissenschaften & Technik
Medium: Buch
Inhalt: xv
167 S.
5 s/w Illustr.
95 farbige Illustr.
167 p. 100 illus.
95 illus. in color.
ISBN-13: 9783031800221
ISBN-10: 3031800222
Sprache: Englisch
Einband: Gebunden
Autor: Lienig, Jens
Thiele, Matthias
Rothe, Susann
Auflage: Second Edition 2025
Hersteller: Springer Nature Switzerland
Springer International Publishing AG
Verantwortliche Person für die EU: Springer Verlag GmbH, Tiergartenstr. 17, D-69121 Heidelberg, juergen.hartmann@springer.com
Maße: 241 x 160 x 16 mm
Von/Mit: Jens Lienig (u. a.)
Erscheinungsdatum: 26.02.2025
Gewicht: 0,479 kg
Artikel-ID: 131699211
Sicherheitshinweis

Ähnliche Produkte

Ähnliche Produkte

Taschenbuch
-16 %
Taschenbuch
-16 %