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Atomic Layer Deposition of Nanostructured Materials
Buch von Nicola Pinna (u. a.)
Sprache: Englisch

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Beschreibung
Atomic layer deposition, formerly called atomic layer epitaxy, was developed in the 1970s to meet the needs of producing high-quality, large-area fl at displays with perfect structure and process controllability. Nowadays, creating nanomaterials and producing nanostructures with structural perfection is an important goal for many applications in nanotechnology. As ALD is one of the important techniques which offers good control over the surface structures created, it is more and more in the focus of scientists. The book is structured in such a way to fi t both the need of the expert reader (due to the systematic presentation of the results at the forefront of the technique and their applications) and the ones of students and newcomers to the fi eld (through the first part detailing the basic aspects of the technique).

This book is a must-have for all Materials Scientists, Surface Chemists, Physicists, and Scientists in the Semiconductor Industry.
Atomic layer deposition, formerly called atomic layer epitaxy, was developed in the 1970s to meet the needs of producing high-quality, large-area fl at displays with perfect structure and process controllability. Nowadays, creating nanomaterials and producing nanostructures with structural perfection is an important goal for many applications in nanotechnology. As ALD is one of the important techniques which offers good control over the surface structures created, it is more and more in the focus of scientists. The book is structured in such a way to fi t both the need of the expert reader (due to the systematic presentation of the results at the forefront of the technique and their applications) and the ones of students and newcomers to the fi eld (through the first part detailing the basic aspects of the technique).

This book is a must-have for all Materials Scientists, Surface Chemists, Physicists, and Scientists in the Semiconductor Industry.
Inhaltsverzeichnis
PART I: Introduction to ALD

THEORETICAL MODELING OF ALD PROCESSES
Introduction
Overview of Atomistic Simulations
Calculation of Properties Using Quantum Simulations
Prediction of ALD Chemical Mechanisms
Example of a Calculated ALD Mechanism: ALD of Al2O3 Using TMA and Water

STEP COVERAGE IN ALD
Introduction
Growth Techniques
Step Coverage Models in ALD
Experimental Verifications of Step Coverage Models
Summary

PRECURSORS FOR ALD PROCESSES
Introduction
General Requirements for ALD Precursors
Metallic Precursors for ALD
Nonmetal Precursors for ALD
Conclusions

SOL-GEL CHEMSTRY AND ATOMIC LAYER DEPOSITION
Aqueous and Nonaqueous Sol-Gel in Solution
Sol-Gel and ALD: An Overview
Mechanistic and In Situ Studies

MOLECULAR LAYER DEPOSITION OF HYBRID ORGANIC-INORGANIC FILMS
Introduction
General Issues for MLD of Hybrid Organic-Inorganic Films
MLD Using Trimethylaluminum and Ethylene Glycol in an AB Process
Expansion to an ABC Process Using Heterobifunctional and Ring-Opening Precursors
Use of a Homotrifunctional Precursor to Promote Cross-Linking in an AB Process
MLD of Hybrid Alumina-Siloxane Films Using an ABCD Process
Future Prospects for MLD of Hybrid Organic-Inorganic Films´

LOW-TEMPERATURE ATOMIC LAYER DEPOSITION
Introduction
Challenges of LT-ALD
Materials and Processes
Toward Novel LT-ALD Processes
Thin Film Gas Diffusion Barriers
Encapsulation of Organic Electronics
Conclusions

PLASMA ATOMIC LAYER DEPOSITION
Introduction
Plasma Basics
Plasma ALD Configurations
Merits of Plasma ALD
Challenges for Plasma ALD
Concluding Remarks and Outlook

PART II: Nanostructures by ALD

ATOMIC LAYER DEPOSITION FOR MICROELECTRONIC APPLICATIONS
Introduction
ALD Layers for Memory Devices
ALD for Logic Devices
Concluding Remarks

NANOPATTERNING BY AREA-SELECTIVE ATOMIC LAYER DEPOSITION
Concept of Area-Selective Atomic Layer Deposition
Change of Surface Properties
Patterning
Applications of AS-ALD
Current Challenges

COATINGS ON HIGH ASPECT RATIO STRUCTURES
Introduction
Models and Analysis
Characterization Methods for ALD Coatings in High Aspect Ratio Structures
Examples of ALD in High Aspect Ratio Structures
Nonideal Behavior during ALD in High Aspect Ratios
Conclusions and Future Outlook

COATINGS OF NANOPARTICLES AND NANOWIRES
ALD on Nanoparticles
Vapor-Liquid-Solid Growth of Nanowires by ALD
Atomic Layer Epitaxy on Nanowires
ALD on Semiconductor NWs for Surface Passivation
ALD-Assisted Formation of Nanopeapods
Photocorrosion of Semiconductor Nanowires Capped by ALD Shell
Interface Reaction of Nanowires with ALD Shell
ALD ZnO on NWs/Tubes as Seed Layer for Growth of Hyperbranch
Conclusions

ATOMIC LAYER DEPOSITION ON SOFT MATERIALS
Introduction
ALD on Polymers for Passivation, Encapsulation, and Surface Modification
ALD for Bulk Modification of Natural and Synthetic Polymers and Molecules
ALD for Polymer Sacrificial Templating: Membranes, Fibers, and Biological and Optical Structures
ALD Nucleation of Patterned and Planar SAMs and Surface Oligomers
Reactions during Al2O3 ALD on Representative Polymer Materials
Summary

APPLICATION OF ALD TO BIOMATERIALS AND BIOCOMPATIBLE COATINGS
Application of ALD to Biomaterials
Biocompatible Coatings
Summary

COATING OF CARBON NANOTUBES
Introduction
Purification and Surface Functionalization of Carbon Nanotubes
Decoration/Coating of Carbon Nanotubes by Solution Routes
Decoration/Coating of Carbon Nanotubes by Gas-Phase Techniques
Atomic Layer Deposition on Carbon Nanotubes
Coating of Large Quantity of CNTs by ALD
ALD Coating of Other sp2-Bonded Carbon Materials
Conclusions

INVERSE
Details
Erscheinungsjahr: 2011
Fachbereich: Technik allgemein
Genre: Technik
Rubrik: Naturwissenschaften & Technik
Medium: Buch
Inhalt: XXXVI
436 S.
132 s/w Illustr.
43 farbige Illustr.
7 s/w Tab.
182 Illustr.
ISBN-13: 9783527327973
ISBN-10: 3527327975
Sprache: Englisch
Herstellernummer: 1132797 000
Redaktion: Pinna, Nicola
Knez, Mato
Herausgeber: Nicola Pinna/Mato Knez
Auflage: 1. Auflage
Hersteller: Wiley-VCH
Abbildungen: 132 SW-Abb., 43 Farbabb., 7 Tabellen
Maße: 247 x 178 x 26 mm
Von/Mit: Nicola Pinna (u. a.)
Erscheinungsdatum: 28.11.2011
Gewicht: 1,024 kg
Artikel-ID: 106954512
Inhaltsverzeichnis
PART I: Introduction to ALD

THEORETICAL MODELING OF ALD PROCESSES
Introduction
Overview of Atomistic Simulations
Calculation of Properties Using Quantum Simulations
Prediction of ALD Chemical Mechanisms
Example of a Calculated ALD Mechanism: ALD of Al2O3 Using TMA and Water

STEP COVERAGE IN ALD
Introduction
Growth Techniques
Step Coverage Models in ALD
Experimental Verifications of Step Coverage Models
Summary

PRECURSORS FOR ALD PROCESSES
Introduction
General Requirements for ALD Precursors
Metallic Precursors for ALD
Nonmetal Precursors for ALD
Conclusions

SOL-GEL CHEMSTRY AND ATOMIC LAYER DEPOSITION
Aqueous and Nonaqueous Sol-Gel in Solution
Sol-Gel and ALD: An Overview
Mechanistic and In Situ Studies

MOLECULAR LAYER DEPOSITION OF HYBRID ORGANIC-INORGANIC FILMS
Introduction
General Issues for MLD of Hybrid Organic-Inorganic Films
MLD Using Trimethylaluminum and Ethylene Glycol in an AB Process
Expansion to an ABC Process Using Heterobifunctional and Ring-Opening Precursors
Use of a Homotrifunctional Precursor to Promote Cross-Linking in an AB Process
MLD of Hybrid Alumina-Siloxane Films Using an ABCD Process
Future Prospects for MLD of Hybrid Organic-Inorganic Films´

LOW-TEMPERATURE ATOMIC LAYER DEPOSITION
Introduction
Challenges of LT-ALD
Materials and Processes
Toward Novel LT-ALD Processes
Thin Film Gas Diffusion Barriers
Encapsulation of Organic Electronics
Conclusions

PLASMA ATOMIC LAYER DEPOSITION
Introduction
Plasma Basics
Plasma ALD Configurations
Merits of Plasma ALD
Challenges for Plasma ALD
Concluding Remarks and Outlook

PART II: Nanostructures by ALD

ATOMIC LAYER DEPOSITION FOR MICROELECTRONIC APPLICATIONS
Introduction
ALD Layers for Memory Devices
ALD for Logic Devices
Concluding Remarks

NANOPATTERNING BY AREA-SELECTIVE ATOMIC LAYER DEPOSITION
Concept of Area-Selective Atomic Layer Deposition
Change of Surface Properties
Patterning
Applications of AS-ALD
Current Challenges

COATINGS ON HIGH ASPECT RATIO STRUCTURES
Introduction
Models and Analysis
Characterization Methods for ALD Coatings in High Aspect Ratio Structures
Examples of ALD in High Aspect Ratio Structures
Nonideal Behavior during ALD in High Aspect Ratios
Conclusions and Future Outlook

COATINGS OF NANOPARTICLES AND NANOWIRES
ALD on Nanoparticles
Vapor-Liquid-Solid Growth of Nanowires by ALD
Atomic Layer Epitaxy on Nanowires
ALD on Semiconductor NWs for Surface Passivation
ALD-Assisted Formation of Nanopeapods
Photocorrosion of Semiconductor Nanowires Capped by ALD Shell
Interface Reaction of Nanowires with ALD Shell
ALD ZnO on NWs/Tubes as Seed Layer for Growth of Hyperbranch
Conclusions

ATOMIC LAYER DEPOSITION ON SOFT MATERIALS
Introduction
ALD on Polymers for Passivation, Encapsulation, and Surface Modification
ALD for Bulk Modification of Natural and Synthetic Polymers and Molecules
ALD for Polymer Sacrificial Templating: Membranes, Fibers, and Biological and Optical Structures
ALD Nucleation of Patterned and Planar SAMs and Surface Oligomers
Reactions during Al2O3 ALD on Representative Polymer Materials
Summary

APPLICATION OF ALD TO BIOMATERIALS AND BIOCOMPATIBLE COATINGS
Application of ALD to Biomaterials
Biocompatible Coatings
Summary

COATING OF CARBON NANOTUBES
Introduction
Purification and Surface Functionalization of Carbon Nanotubes
Decoration/Coating of Carbon Nanotubes by Solution Routes
Decoration/Coating of Carbon Nanotubes by Gas-Phase Techniques
Atomic Layer Deposition on Carbon Nanotubes
Coating of Large Quantity of CNTs by ALD
ALD Coating of Other sp2-Bonded Carbon Materials
Conclusions

INVERSE
Details
Erscheinungsjahr: 2011
Fachbereich: Technik allgemein
Genre: Technik
Rubrik: Naturwissenschaften & Technik
Medium: Buch
Inhalt: XXXVI
436 S.
132 s/w Illustr.
43 farbige Illustr.
7 s/w Tab.
182 Illustr.
ISBN-13: 9783527327973
ISBN-10: 3527327975
Sprache: Englisch
Herstellernummer: 1132797 000
Redaktion: Pinna, Nicola
Knez, Mato
Herausgeber: Nicola Pinna/Mato Knez
Auflage: 1. Auflage
Hersteller: Wiley-VCH
Abbildungen: 132 SW-Abb., 43 Farbabb., 7 Tabellen
Maße: 247 x 178 x 26 mm
Von/Mit: Nicola Pinna (u. a.)
Erscheinungsdatum: 28.11.2011
Gewicht: 1,024 kg
Artikel-ID: 106954512
Warnhinweis